This 3-day course will give an overview of semiconductor lithographic technologies, comprising optical, extreme ultraviolet, electron beam, and ion beam lithography in terms of their exposure systems, operational principles and theories that underpin them; strategies, processes, and materials used in their operations; their unique features, strengths, and limitations; and specific applications to which they are targeted. Also covered in the course are status, technical challenges, scaling, and future trends of semiconductor lithographic technologies in general.

Dr. Okoroanyanwu is also teaching the 2-day course 856 Alternative Lithography . If booking both these courses in the same week, the total course fee will be EUR 3540 pp (Early Bird) or EUR 3935 (regular fee).

This is a 2-day course, which gives an overview of alternative lithographic technologies, including imprint lithography; colloidal particle self-assembly, self-assembling monolayer, and directed block copolymer self-assembly lithography; scanning (proximal) probe lithography based on scanning tunneling microscopy, scanning atomic force microscopy; stereolithography, and interference lithography. Emphasis will be on each alternative lithographic technique’s tool systems, operational principles and theories that underpin their operation; strategies, processes, and materials used in their operations; their unique features, strengths, and limitations; and specific applications to which they are targeted. Also covered in the course are status, technical challenges, scaling, and future trends of alternative lithographic technologies in general.

Dr. Okoroanyanwu is also teaching the 3-day course 855 Semiconductor Lithography If booking both these courses in the same week, the total course fee will be EUR 3540 pp (Early Bird) or EUR 3935 (Regular fee).